Extreme Ultraviolet Lithography (EUVL) – Report
Extreme Ultraviolet Lithography (EUVL) is an advanced technology using a light source of 13.5 nm and is a leading candidate for 22 nm node lithography and beyond. EUV lithography is now in the pilot phase with 0.33-NA tools at chip manufacturing sites. Mass-scale production is expected in near future.
EUV – Technology Updates
- Multiple patterning
- Atomic Layer Deposition (ALD)
- Dubbed High NA
- High-NA platform, called ‘EXE
EUV Lithography: What is next?
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Extreme Ultraviolet Lithography (EUVL) - Report
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