Extreme Ultraviolet Lithography (EUVL) – Report
Extreme Ultraviolet Lithography (EUVL) is an advanced technology using a light source of 13.5 nm and is a leading candidate for 22 nm node lithography and beyond. EUV lithography is now in the pilot phase with 0.33-NA tools at chip manufacturing sites. Mass-scale production is expected in near future.
EUV – Technology Updates
- Multiple patterning
- Atomic Layer Deposition (ALD)
- Pellicle
- Dubbed High NA
- High-NA platform, called ‘EXE
EUV Lithography: What is next?
About TTC
We’ve constantly identified the value of new technology carried out by our pretty skilled executive crew with backgrounds as our professionals. Like the IP professionals we empower, our starvation for development is never-ending. We IMPROVISE, ADAPT, and IMPLEMENT in a strategic manner.
You also can Contact us to set up a consultation.
TT Consultants offers a range of efficient, high-quality solutions for your intellectual property management ranging from Patentability Search, Invalidation Search, FTO (Freedom to Operate), Patent Portfolio Optimization, Patent Monitoring, Infringement Search, Patent Drafting & Illustrations, and much more. We provide both law firms and corporations in many industries with turnkey solutions.
Download Report
Extreme Ultraviolet Lithography (EUVL) - Report
Send download link to:
*We’ll never share your email with anyone else.
